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　　This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy.Example problems at the end of chapters and other features clarify and improve understanding of the material.

本書特色

　　The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including:

　　* Metal-solution interphase
　　* Charge transfer across an interphase
　　* Formation of an equilibrium electrode potential
　　* Nucleation and growth of thin films
　　* Kinetics and mechanisms of electrodeposition
　　* Electroless deposition
　　* In situ characterization of deposition processes
　　* Structure and properties of deposits
　　* Multilayered and composite thin films
　　* Interdiffusion in thin film
　　* Applications in the semiconductor industry and the field of medicine

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